Atomic layer deposition of conformal dielectric and protective coatings for released micro-electromechanical devices

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2002, Pages 455-458

  Hoivik, Nils ^a   Elam, Jeffrey ^a   Linderman, Ryan ^a   Bright, Victor M ^a   George, Steven ^a   Lee, Y C ^a  

^a University of Colorado at Boulder   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMS; COATING TECHNIQUES; DIELECTRIC MATERIALS; ELECTROSTATICS; PROTECTIVE COATINGS; SEMICONDUCTOR DEVICE MANUFACTURE; STIFFNESS;

ATOMIC LAYER DEPOSITION; CONFORMAL LAYER DEPOSITION; ELECTROSTATIC TESTING;

MICROELECTROMECHANICAL DEVICES;

EID: 0036121903     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. Surface chemistry for atomic layer growth
2. Novel low-temperature CVD process for silicon carbide MEMS
3. Self-assembled monolayers as anti-stiction coatings for MEMS: Characteristics and recent developments
4. The resonant micro fan for fluidic transport, mixing and particle filtering