100 nm device fabrication using ArF resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 571-576

  Lee, Sung Koo ^a   Jung, Jae Chang ^a   Hwang, Young Sun ^a   Park, Kyu Dong ^a   Kim, Jin Soo ^a   Kong, Keun Kyu ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Acrylate; ArF lithography; COMA(Cycloolefin maleic anhydride)

Indexed keywords

CURING; DYNAMIC RANDOM ACCESS STORAGE; ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

RESIST FLOW PROCESS (RFP);

PHOTORESISTS;

EID: 0036031227     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474257     Document Type: Conference Paper

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