Acid mobility in chemically amplified photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 943-951

  Stewart, Michael D ^a   Becker, Darren J ^a   Stachowiak, Timothy B ^a   Schmid, Gerard M ^a   Michaelson, Timothy B ^a   Tran, Hoang Vi ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Acid diffusion; CD bias; Post exposure bake

Indexed keywords

AMPLIFICATION; CATALYSTS; CHEMICAL REACTIONS; DIFFUSION; ORGANIC ACIDS; PHOTOCATALYSIS; PHOTONS; SOLUBILITY;

ACID DIFFUSION; ACID MOBILITY;

PHOTORESISTS;

EID: 0036030941     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474168     Document Type: Conference Paper

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