Optimization of segmented alignment marks for advanced semiconductor fabrication processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 234-244

  Wu, Qiang ^a   Lu, Z George ^a,b   Williams, Gary ^a,b   Zach, Franz ^a   Liegl, Bernhard ^a,b  

^a IBM MICROELECTRONICS   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFRACTION GRATINGS; FINITE DIFFERENCE METHOD; LITHOGRAPHY; TIME DOMAIN ANALYSIS;

SEMICONDUCTOR FABRICATION PROCESS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034758308     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436746     Document Type: Article

References (2)

1. Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
2. Sub-wavelength alignment mark signal analysis of advanced memory products