Fluorocarbon based single-layer resist for 157 nm lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 504-511

  Song, Ki Yong ^a   Yoon, Kwang Sub ^a   Choi, Sang Jun ^a   Woo, Sang Gyun ^a   Han, Woo Sung ^a   Lee, Jae Jun ^b   Lee, Sang Kyun ^b   Noh, Chang Ho ^b   Honda, Kenji ^b  

^a SAMSUNG Electronics   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

157 nm; Absorbance; Fluoropolymer; Photolithography; Photoresist; Silylation

Indexed keywords

ACIDITY; ACRYLICS; FLUOROCARBONS; FUNCTIONAL POLYMERS; RESINS; STYRENE;

ETCH RESISTANCE;

PHOTORESISTS;

EID: 0036029127     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474248     Document Type: Article

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