Ultra thin film imaging at 157 nm

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 233-241

  Rottstegge, Jörg ^a   Herbst, Waltraud ^a   Hien, Stefan ^a   Fütterer, Gerald ^b   Eschbaumer, Christian ^a   Hohle, Christoph ^a   Schwider, Johannes ^b   Sebald, Michael ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

157 nm; Carl; Silylation; Ultra thin film imaging

Indexed keywords

ETCHING; IMAGING TECHNIQUES; SILICON; SUBSTRATES; ULTRATHIN FILMS;

SILYLATION; ULTRA THIN FILM IMAGING;

LITHOGRAPHY;

EID: 0036029125     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474249     Document Type: Article

References (14)

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