메뉴 건너뛰기




Volumn 41, Issue 4, 2002, Pages 487-492

Novel cell architecture for high performance of 512-Mb DRAM with 0.12-μm design rule

Author keywords

Date retention time SALFI(self aligned local field implantation); DMO(dual oxide capacitor); Gate dual space

Indexed keywords


EID: 0035981422     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.