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Volumn 94, Issue 1-2, 2001, Pages 87-94

Etching characteristics and mechanical properties of a-SiC:H thin films

Author keywords

Amorphous silicon carbide (a SiC:H); Etch rate; Film stress; Harsh environment; Young's modulus

Indexed keywords

ELASTIC MODULI; ENERGY GAP; ETCHING; HOLOGRAPHIC INTERFEROMETRY; MICROMACHINING; MICROSENSORS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; STRESS ANALYSIS; SUBSTRATES; THERMAL EFFECTS; YIELD STRESS;

EID: 0035980386     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00683-5     Document Type: Article
Times cited : (34)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.