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Volumn 94, Issue 1-2, 2001, Pages 87-94
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Etching characteristics and mechanical properties of a-SiC:H thin films
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Author keywords
Amorphous silicon carbide (a SiC:H); Etch rate; Film stress; Harsh environment; Young's modulus
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Indexed keywords
ELASTIC MODULI;
ENERGY GAP;
ETCHING;
HOLOGRAPHIC INTERFEROMETRY;
MICROMACHINING;
MICROSENSORS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON CARBIDE;
STRESS ANALYSIS;
SUBSTRATES;
THERMAL EFFECTS;
YIELD STRESS;
GAS MIXTURES;
THIN FILMS;
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EID: 0035980386
PISSN: 09244247
EISSN: None
Source Type: Journal
DOI: 10.1016/S0924-4247(01)00683-5 Document Type: Article |
Times cited : (34)
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References (23)
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