|
Volumn , Issue , 1999, Pages 23-28
|
Modeling of production scale reactive deposition
a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ABSORPTION;
FILMS;
HYSTERESIS;
MAGNETRON SPUTTERING;
MATHEMATICAL MODELS;
PROCESS CONTROL;
THREE TERM CONTROL SYSTEMS;
TITANIUM DIOXIDE;
ACTIVE CONTROL;
BERG MODEL;
DEPOSITION RATE;
HYSTERESIS CURVE;
REACTIVE DEPOSITION;
DEPOSITION;
|
EID: 0032606256
PISSN: 07375921
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (6)
|
References (4)
|