Electrical properties of metal/porous silicon/p-Si structures with thin porous silicon layer

Journal of Applied Physics

Volumn 90, Issue 8, 2001, Pages 4184-4190

  Balagurov, L A ^a   Bayliss, S C ^b   Orlov, A F ^a   Petrova, E A ^a   Unal, B ^b   Yarkin, D G ^a  

^a INSTITUTE OF RARE METALS   (Russian Federation)

^b DE MONTFORT UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035886238     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1402670     Document Type: Article

References (25)

1. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. A. G. Cullis, L. T. Canham, and P. D. J. Calcot, J. Appl. Phys. 82, 909 (1997).
3. Properties of Porous Silicon, edited by L. T. Canham (JEE INSPEC London, 1997).
4. I. Balberg, Philos. Mag. B 80, 691 (2000).
5. D. Deresmes, V. Marisael, D. Stievenard, and C. Ortega, Thin Solid Films 255, 258 (1995).
6. D. B. Dimitrov. Phys. Rev. B 51, 1562 (1995).
7. Z. Chen, T.-Y. Lee, and G. Bosman, J. Appl. Phys. 76, 2499 (1994).
8. V. Yu. Timoshenko, P. K. Kashkarov, and A. B. Matveeva, E. A. Konstantinova, H. Flietner, and Th. Dittrich, Thin Solid Films 276, 216 (1996).
9. L. A. Balagurov, S. C. Bayliss, A. F. Orlov, B. Unal, and D. G. Yarkin, Solid-State Electron. 45, 1607 (2001).
10. S. M. Sze, Physics of Semiconductor Devices, 2nd ed., (Wiley, New York, 1981).
11. D. E. Aspnes and J. B. Theeten, R. J. Pearson, and R. Greef, J. Appl. Phys. 50, 4928 (1979).
12. C. Pickering, M. I. J. Beale, D. J. Robbins, R. J. Pearson, and R. Greef, J. Phys. C 17, 6535 (1984).
13. N. J. Pulstord et al., J. Appl. Phys. 75, 636 (1994).
14. C. Peng, K. D. Hirschman, and P. M. Fauchet, J. Appl. Phys. 80, 295 (1996).
15. L. A. Balagurov et al., J. Appl. Phys. 82, 4647 (1997).
16. K. Khirouni, J. C. Bourgoin, K. Borgi, H. Maaref, D. Deresmes, and D. Stievenard, Mater. Res. Soc. Symp. Proc. 452, 619 (1997).
17. M. Ben-Chorin, F. Muller, and F. Koch. Phys. Rev. B 49, 2981 (1994).
18. R. J. Martin-Palma, J. Perez-Rigueiro, and J. M. Martinez-Duart, J. Appl. Phys. 86, 6911 (1999).
19. V. P. Parkhutik, Thin Solid Films 276, 195 (1996).
20. W. H. Lee, C. Lee, and J. Jang, J. Non-Cryst. Solids 200, 911 (1996).
21. M. J. Winton and S. D. Russel, Phys. Rev. B 8, 607 (1973).
22. B. Hamilton, J. Jacobs, D. A. Hill, R. F. Pettifer, D. Teehan, and L. T. Canham. Nature (London) 393, 443 (1998).
23. T. Matsumoto, H. Mimura, N. Koshida, and Y. Masumoto, Appl. Surf. Sci. 142, 569 (1999).
24. L. A. Balagurov, D. G. Yarkin, and E. A. Petrova, Mater. Sci. Eng., B 69-70, 127 (2000).
25. L. Pavesi, R. Chierchia, P. Bellutti, A. Lui, F. Fuso, M. Labardi, L. Pardi, F. Sbrana, and M. Allegrini, Jpn. J. Appl. Phys., Part 1 86, 6474 (1999).