Spatial effects on ideality factor of amorphous silicon pin diodes

Journal of Applied Physics

Volumn 90, Issue 2, 2001, Pages 994-1000

  Kroon, M A ^a   Van Swaaij, R A C M M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035878836     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1379560     Document Type: Article

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