Microstructure and electrical properties of CoNX thin films deposited by unbalanced magnetron sputtering

Vacuum

Volumn 62, Issue 2-3, 2001, Pages 293-296

  Asahara, H ^a   Migita, T ^a   Tanaka, T ^a   Kawabata, K ^a  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cobalt nitride; Magnetron sputtering; Multipolar magnetic plasma confinement; Nanocomposite; Sputtering

Indexed keywords

COBALT COMPOUNDS; CONDUCTIVE FILMS; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NITRIDES; PLASMA CONFINEMENT; SPUTTER DEPOSITION;

MULTIPOLAR MAGNETIC PLASMA CONFINEMENT;

MAGNETIC THIN FILMS;

EID: 0035876023     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00453-X     Document Type: Article

References (11)