Sputtered Cu/Co films for giant magnetoresistance: Effect of plasma gas and annealing treatment

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2807-2811

  Maya, L ^a   Paranthaman, M ^a   List, F A ^a   Warmack, R J ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031489347     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580828     Document Type: Article

References (12)

1. D. E. Laughlin, B. Cheong, Y. C. Feng, D. N. Lambeth, L. L. Lee, and B. Wong, Scr. Mater. 33, 1593 (1995).
2. M. N. Baibich, J. M. Broto, A. Fert, F. Nguyen van Dau, F. Petroff, P. Etienne, G. Creuzet, A. Frederich, and J. Chazeles, Phys. Rev. Lett. 61, 2472 (1988).
3. K. R. Coffey, T. L. Hylton, M. A. Parker, and J. K. Howard, Scr. Mater. 33, 1593 (1995).
4. S. S. Parkin, N. More, and K. P. Roche, Phys. Rev. Lett. 64, 2304 (1990).
5. A. E. Berkowitz, J. R. Mitchel, M. J. Carey, A. P. Young, S. Zhang, F. E. Spada, F. T. Parker, A. Hutten, and G. Thomas, Phys. Rev. Lett. 68, 3745 (1992).
6. J. Q. Xiao, J. S. Jiang, and C. L. Chien, Phys. Rev. Lett. 68, 3749 (1992).
7. P. M. Levy, Solid State Physics, edited by H. Ehrenreich and D. Turnbull (Academic, New York, 1994), Vol. 47.
8. L. Maya, J. Vac. Sci. Technol. A 11, 604 (1993).
9. L. Maya, M. Paranthaman, J. R. Thompson, T. Thundat, and R. J. Stevenson, J. Appl. Phys. 79, 7905 (1996).
10. J. R. Childress and C. L. Chien, J. Appl. Phys. 70, 5885 (1991).
11. R. J. Pollard, M. J. Wilson, and P. J. Grundy. Mater. Res. Soc. Symp. Proc. 384, 365 (1995).
12. J. J. Becker, Trans. AIME 200, 59 (1957).