Preparation of Co and CoNx thin films by unbalanced radio frequency magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1649-1652

  Tanaka, T ^a   Kawabata, K ^a   Kitabatake, A ^b  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b Sanyo Vacuum Ind Co LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COBALT; COBALT COMPOUNDS; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NITROGEN; PLASMA CONFINEMENT; SPUTTER DEPOSITION;

COBALT NITRIDE;

MAGNETIC THIN FILMS;

EID: 0034224551     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582400     Document Type: Article

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