Nitridation of vanadium in molecular nitrogen: A comparison of rapid thermal processing (RTF) and conventional furnace annealing

Vacuum

Volumn 61, Issue 2-4, 2001, Pages 479-484

  Galesic, I ^a   Reusch, U ^b   Angelkort, C ^a   Lewalter, H ^a   Berendes, A ^a   Schweda, E ^b   Kolbesen, B O ^a  

^a GOETHE UNIVERSITY   (Germany)

^b UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

In situ XRD; Nitrides; Rapid thermal processing; Solid gas reaction; Thin films

Indexed keywords

NITRIDING; NITROGEN; RAPID THERMAL ANNEALING; VANADIUM; X RAY DIFFRACTION ANALYSIS;

CONVENTIONAL FURNACE ANNEALING;

VACUUM TECHNOLOGY;

EID: 0035858512     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(01)00152-x     Document Type: Article

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