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Applied Physics Letters

Volumn 78, Issue 20, 2001, Pages 3091-3093

Formation of cobalt silicide spikes in 0.18 μm complementary metal oxide semiconductor process

(6) Dai, J Y a Guo, Z R a Tee, S F a Tay, C L a Er, Eddie a Redkar, S a

a CHARTERED SEMICONDUCTOR MANUFACTURING LTD (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035858335 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1372621 Document Type: Article

Times cited : (23)

References (16)

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