SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 141, Issue 1, 2001, Pages 88-95

Low-pressure chemical vapour deposition of mullite layers using a cold-wall reactor

(5) Armas, B a Sibieude, F a Mazel, A b Fourmeaux, R b De Icaza Herrera, M c

a Centre National de la Recherche Scientifique (France)

b CEMES CNRS (France)

c CENTRO DE FÍSICA APLICADA Y TECNOLOGÍA AVANZADA (Mexico)

Author keywords

Chlorides precursors; cold wall reactor; Low pressure chemical vapour deposition; Mullite

Indexed keywords

ALUMINUM COMPOUNDS; COATINGS; COMPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; MORPHOLOGY; SILICON COMPOUNDS;

MULLITE COATINGS;

CHEMICAL VAPOR DEPOSITION;

COATING; CORROSION PREVENTION; HIGH TEMPERATURE CORROSION; MULLITE; VAPOR DEPOSITION;

EID: 0035806215 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01132-X Document Type: Article

Times cited : (10)

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