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Volumn 17, Issue 15-16, 1997, Pages 1803-1806

Low pressure chemical vapour deposition of AlN-Si3N4 codeposits

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0004822323     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0955-2219(97)00072-1     Document Type: Article
Times cited : (3)

References (13)
  • 5
    • 0016940203 scopus 로고
    • Chemical vapour deposited silicon nitride. Part 1. Preparation and some properties
    • Niihara, K. and Hirai, T., Chemical vapour deposited silicon nitride. Part 1. Preparation and some properties. Journal of Mater. Sci., 1976, 11, 593-603.
    • (1976) Journal of Mater. Sci. , vol.11 , pp. 593-603
    • Niihara, K.1    Hirai, T.2
  • 6
    • 0016926486 scopus 로고
    • Thermodynamics and kinetics of oxidation of hot-pressed silicon nitride
    • Singhal, S. C., Thermodynamics and kinetics of oxidation of hot-pressed silicon nitride. Journal of Mater. Science, 1976, 11, 500-509.
    • (1976) Journal of Mater. Science , vol.11 , pp. 500-509
    • Singhal, S.C.1
  • 13
    • 0042971982 scopus 로고
    • ed. D. Briggs and M. P. Seah, J. Wiley and Sons Ltd, Chichester, Appendix 4
    • Wagner, C. D., in Practical Surface Analysis, ed. D. Briggs and M. P. Seah, J. Wiley and Sons Ltd, Chichester, 1983, Appendix 4, p. 477.
    • (1983) Practical Surface Analysis , pp. 477
    • Wagner, C.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.