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Materials Research Bulletin

Volumn 34, Issue 9, 1999, Pages 1473-1479

Phase transformation and morphological evolution of ion-beam sputtered tin oxide films on silicon substrate

(5) Choe, Yong Sahm a Chung, Jae Ho b Kim, Dae Seung b Kim, Gyeung Ho c Baik, Hong Koo a

a Yonsei University (South Korea)

b Tong Yang Moolsan Co Ltd (South Korea)

c Korea Institute of Science and Technology (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; DEPOSITION; ION BEAMS; MORPHOLOGY; OXIDATION; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTERING; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

ION BEAM SPUTTERING; MORPHOLOGICAL CHANGES; TIN OXIDE;

OXIDES;

EID: 0033157664 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/S0025-5408(99)00139-7 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.