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Surface Science

Volumn 432, Issue 3, 1999, Pages 189-198

Growth, electronic properties and reactivity of vanadium deposited onto a thin alumina film

(3) Baumer M a Biener, J b Madix, R J b

a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT (Germany)

b Stanford University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRONIC PROPERTIES; FILM GROWTH; INTERFACES (MATERIALS); MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACE TOPOGRAPHY; SYNCHROTRON RADIATION; VANADIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CATALYTIC EFFECTS; CHEMICAL REACTIVITY; X RAY ABSORPTION SPECTROSCOPY;

ALUMINA;

EID: 0037514651 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(99)00400-8 Document Type: Article

Times cited : (46)

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