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Volumn 45, Issue 11, 2001, Pages 1267-1272

Dislocation behavior in heavily impurity doped Si

Author keywords

Dislocation mobility; Dislocations; Elemental semiconductor; Impurity; Segregation

Indexed keywords

CRYSTAL GROWTH; CRYSTAL IMPURITIES; DISLOCATIONS (CRYSTALS); EPITAXIAL GROWTH; SEMICONDUCTOR DOPING; SILICON WAFERS; SUBSTRATES;

EID: 0035802564     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(01)01160-5     Document Type: Article
Times cited : (21)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.