Wavelength dependant mask defect inspection and printing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 496-502

  McCallum, Martin ^a  

^a Nikon Precision Europe GmbH   (United Kingdom)

Author keywords

Actinic inspection; Alternating PSM; High NA; Quartz defects

Indexed keywords

COMPUTER SIMULATION; DEFECTS; IMAGE PROCESSING; PHASE SHIFT; QUARTZ;

PHASE SHIFT MASKS (PSM);

MASKS;

EID: 0035768132     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458326     Document Type: Conference Paper

References (5)

1. M.D. Levenson, N.S. Visanathan, R.A. Simpson, "Improving resolution in photolithography with a phase-shifting mask", IEEE Transactions on Electron Devices, Vol ED-29, No. 12, pp.1828-1836, 1982.
2. A. Wong, "Rigorous three-dimensional time-domain finite-difference electromagnetic simulation", Ph.D. dissertation, University of California at Berkeley, 1994.
3. C.K. Kalus, S. List, A. Erdmann, R.L. Gordon, M. McCallum, A. Semmler, "Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift masks applications", Microelectronic Engineering, pp.79-86, 2001.
4. T.V. Pistor, A.R. Neureuther, R.J. Socha, "Modeling oblique incidence effects in photomasks", SPIE 4000, pp.228-237, 2000.
5. D. Alles, P. Ter Beek, S.T. Juang, J.N. Wiley, K. Hsai, "Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-um technology node", SPIE 4066, pp.462-471, 2000.