Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 79-86

  Kalus, Christian K ^a   List, Steffen ^a   Erdmann, Andreas ^b   Gordon, Ron ^c   McCallum, M ^c   Semmler, A ^d  

^a SIGMA C   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^c SEMATECH   (United States)

^d INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Benchmarking; Electromagnetic field solver; Microlithography; Phase shifting masks; Simulation

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELDS; FINITE DIFFERENCE METHOD; MAXWELL EQUATIONS; PHASE SHIFT; PHOTOLITHOGRAPHY; SIMULATORS; TIME DOMAIN ANALYSIS;

PHASE-SHIFT MASKS;

MASKS;

EID: 0035450047     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00438-5     Document Type: Article

References (5)