Reticle inspection system using DUV wavelength and new algorithm platform for advanced reticle inspection for 0.13 micron technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 462-471

  Alles, D ^a   Ter Beek, P ^a   Juang, S ^a   Wiley, J ^a   Hsia, K ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; DATABASE SYSTEMS; IMAGE QUALITY; IMAGING TECHNIQUES; INSPECTION; LASER APPLICATIONS; MASKS; OPTICAL SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE;

DATA PREPARATION SYSTEMS; LOW NOISE OPTICAL SYSTEM; RETICLE INSPECTION SYSTEM; TOTAL PLATE QUALITY; ULTRA PERFORMANCE ALGORITHM; UNITED INSPECTION COMPUTER;

OPTICAL DEVICES;

EID: 0033666115     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)