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Volumn 4499, Issue , 2001, Pages 96-104

Tunable diffractive optical elements for hard x-rays

Author keywords

Beam splitter; Coherence; Decoherer; Electron beam lithography; Interferometry; Wet etching; Zone plate

Indexed keywords

DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; ETCHING; FOCUSING; INTERFEROMETRY; LENSES; OPTICAL BEAM SPLITTERS; OPTICAL FIBER FABRICATION; PHOTONS; SUBSTRATES; SYNCHROTRON RADIATION;

EID: 0035767655     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450226     Document Type: Article
Times cited : (8)

References (23)
  • 4
    • 84995714045 scopus 로고    scopus 로고
    • Japanese Patent No. 06045288 (1994) US Patent No. 5594773 (1997), German Patent No. DE1995019505433 (1998)
    • T. Tomie. Japanese Patent No. 06045288 (1994), US Patent No. 5594773 (1997), German Patent No. DE1995019505433 (1998)
    • Tomie, T.1
  • 7
    • 0038124992 scopus 로고
    • Eds.: A.G. Michette, G.R. Morrison, and C.J. Buckley, Springer
    • F. Anderson and D. Kern, in: X-Ray Microscopy III, Eds.: A.G. Michette, G.R. Morrison, and C.J. Buckley, Springer (1990) 75
    • (1990) X-Ray Microscopy III , pp. 75
    • Anderson, F.1    Kern, D.2
  • 16
    • 0000602084 scopus 로고
    • For a review of vertical silicon wet etching see: D.L. Kendall: J. Vac. Sci. Technol. A 8 (1990) 3598 - 3605
    • (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 3598-3605
    • Kendall, D.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.