Optimization of ARF alternating phase-shifting mask structure, for 100nm node, and inspection of phase defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 430-440

  Chiba, Kazuaki ^a   Takahashi, Hiroyuki ^a   Nozaki, Wataru ^a   Akima, Shinji ^a   Nagashige, Susumu ^a   Yamada, Yoshiro ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

AIMS; Alternating Phase Shift Mask; DUV; Phase Defect; PSM; UV Inspection

Indexed keywords

ARGON; DEFECTS; IMAGE ENHANCEMENT; INSPECTION; LITHOGRAPHY; PHASE SHIFT; ULTRAVIOLET RADIATION;

PHOTOMASKS;

MASKS;

EID: 0035766036     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458319     Document Type: Article

References (5)

1. Shiaki Murai, et al., "Establishment of Production Process and Assurance Method for Alternating Phase Shift Masks", SPIE Vol.4186, 2001, pp890-901.
2. Susumu Nagashige, et al., "Detection and repair of multiphase defects on alternating phase shift masks for DUV lithography", SPIE Vol.3873, 1999, pp127-137.
3. Uwe A.Griesinger, et al., "Balancing of Alternating Phase Shifting Masks for Practical Application: Modeling and Experimental Verification", SPIE Vol.4186, 2001, pp372-383.
4. Uwe A.Griesinger, et al., "Transmission & Phase Balancing of alternating Phase Shifting Masks(5X)-Theoretical & Experimental Results", SPIE Vol.3873, 1999, pp359-369.
5. In-Gyun Shin, et al., "A study on the effect of mask reduction ratio in alternating phase shift masks", SPIE Vol.4186, 2001, pp309-315.