A study on the effect of mask reduction ratio in alternating phase shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 309-315

  Shin, I G ^a   Lee, S W ^a   Kim, Y H ^a   Choi, S W ^a   Han, W S ^a   Sohn, J M ^a   Lim, T K ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Aerial image imbalance; Alternating phase shift mask; Phase; Reduction ratio; Undercut

Indexed keywords

COMPUTER SIMULATION; ETCHING; IMAGE ANALYSIS; PHASE SHIFT; TOPOLOGY;

CRITICAL DIMENSIONS (CD); MASK REDUCTION RATIO; PHASE SHIFTING MASKS (PSM);

MASKS;

EID: 0035037640     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410707     Document Type: Conference Paper

References (5)

1. Challenge to 0.13-um device patterning using KrF
2. Improving resolution in photolithography with a phase shifting mask
3. Throgh-focus image balancing of alternating phase-shifting masks
4. Phase-shifting mask topography effect on lithographic image quality
5. Transmission and phase balancing of alternating phase-shifting masks(5X): Theoretical and experimental results