Toward the micromachined vibrating gyroscope using (111) silicon wafer process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4557, Issue , 2001, Pages 40-48

  Hsieh, Jerwei ^a   Chen, Wen Chih ^a   Fang, Weileun ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

(111) silicon wafer; BELST process; Boron etching stop; Corner compensation; Gyroscope; RIE lag

Indexed keywords

ETCHING; FABRICATION; GYROSCOPES; MICROMACHINING;

MICROMACHINED VIBRATING GYROSCOPES (MVG);

SILICON WAFERS;

EID: 0035765672     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.442961     Document Type: Conference Paper

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