Measurement of total integrated scatter of optical coatings for 157nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4449, Issue , 2001, Pages 22-29

  Saito, T ^a   Saito, J ^a   Nakamura, E ^b   Kudo, T ^b   Kagaya, M ^b   Takahashi, T ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

157nm optics; Coating; Coblentz hemisphere; Scatter

Indexed keywords

AIR; LIGHT SCATTERING; LITHOGRAPHY; NITROGEN; OPTICAL DESIGN; OPTICAL INSTRUMENTS; OPTICAL MATERIALS; OPTICAL VARIABLES MEASUREMENT; REFRACTIVE INDEX; SODIUM COMPOUNDS; WATER;

COBLENTZ HEMISPHERE; COBLENTZ TYPE SCATTEROMETER; ELLIPSOIDAL DESIGN; ORGANIC CONTAMINATION;

ANTIREFLECTION COATINGS;

EID: 0035763546     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450106     Document Type: Article

References (6)

1. ISO/DIS 13696 "Optics and optical instruments - Test methods for radiation scattered by optical components", ISO/TC 172/SC 9/WG 6 Document N130, 1999
2. H.A.Macleod, Thin-Film Optical Filters 2nd ed., Adam Hilger Ltd., Bristol, 1986
3. P.Kadkhoda, H.Welling, St.Guenster, and D.Ristau' Investigation on total scattering at 157nm and 193nm", Proceedings of SPIE Vol.4099-09, 2000
4. S.Gliech, J.Steinert, M.Flemming, and A.Duparre' DUV/VUV light scattering measurement of optical components for lithography applications", Proceedings of SPIE Vol.4099-10, 2000
5. M.Zukic, D.G.Torr, J.F.Spann, and M.R.Torr' Vacuum ultraviolet thin films.", Appl. Opt., 29(28), pp4284-4302, 1990
6. O.Apel and K.Mann' DUV scattering measurements as a tool for characterization of UV-optical surfaces", Appl.Phys., A72, pp59-65, 2001