Advantages of a new sub-nanometer aspheric profiling technique with respect to the unique requirements of EUV lithography mirrors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4449, Issue , 2001, Pages 184-194

  Glenn, Paul ^a  

^a NONE   (United States)

Author keywords

Aspheric; EUV; Full aperture; Lithography; Metrology; Noncontact; Profilometer; Self referencing

Indexed keywords

ASPHERICS; DIFFRACTION GRATINGS; INSPECTION; LITHOGRAPHY; MIRRORS; OPTICAL DESIGN; OPTICAL VARIABLES MEASUREMENT; SILICON WAFERS; SURFACE PROPERTIES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET; FIELD OF VIEWS; FULL APERTURE; NONCONTACT; NUMERICAL APERTURES; PROFILOMETER; SELF REFERENCING;

OPTICAL DEVICES;

EID: 0035763053     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.450094     Document Type: Conference Paper

References (14)

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