Novel interferometer to measure the figure of aspherical mirrors as used in EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 784-793

  Klaver, R G ^a   Braat, J J M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCY MODULATION; HETERODYNING; INTERFEROMETERS; LIGHT MEASUREMENT; MIRRORS; ULTRAVIOLET RADIATION; WAVEFRONTS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033702761     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)