Achieving low wavefront specifications for duv lithography; impact of residual stress in hpfs® fused silica

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1416-1423

  Ladison, Julie L ^a   Ellison, Joseph F ^a   Allan, Douglas C ^a   Fladd, David R ^b   Fanning, Andrew W ^c   Priestley, Richard ^a  

^a Corning Inc ^*  (United States)

^b jacobian Technologies   (United States)

^c Fanning Technical Services   (United States)

Author keywords

Birefringence; Code 7980; Hinds exicor ; Hpfs fused silica; Interferometry; Metropro; Refractive index; Wavefront distortion; Zygo interferometer

Indexed keywords

BIREFRINGENCE; FUSED SILICA; INTERFEROMETERS; OPTICAL CORRELATION; REFRACTIVE INDEX; RESIDUAL STRESSES; ULTRAVIOLET RADIATION; WAVEFRONTS;

WAVEFRONT DISTORTIONS;

PHOTOLITHOGRAPHY;

EID: 0035759064     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435680     Document Type: Article

References (8)

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