Measurement of residual birefringence in photomask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue , 1999, Pages

  Wang, Baoliang ^a   Troccolo, Patrick M ^a  

^a Hinds Instruments Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; CALCIUM COMPOUNDS; FUSED SILICA; LIGHT MODULATORS; MASKS; QUALITY CONTROL;

PHOTOMASK BLANKS; RESIDUAL LINEAR BIREFRINGENCE;

PHOTOLITHOGRAPHY;

EID: 0033309255     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)