Error separation technique for microlithographic lens testing with null configurations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1328-1339

  Mack, Stephen ^a   Rich, Tim ^a   Webb, James ^a   Dewa, Paul ^a   Schreiber, Horst ^a  

^a Tropel Corporation ^*  (United States)

Author keywords

157 nm; Absolute testing; Error separation; F2 excimer laser; Interferometer; Null corrector; Self calibration; Wavefront; Zernike

Indexed keywords

ALGORITHMS; COHERENT LIGHT; ERROR ANALYSIS; EXCIMER LASERS; INTERFEROMETERS; OPTICAL COATINGS; OPTICAL INSTRUMENT LENSES; OPTICAL MATERIALS;

MICROLITHOGRAPHIC LENSES;

PHOTOLITHOGRAPHY;

EID: 0035759062     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435669     Document Type: Conference Paper

References (19)

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