ArF imaging modeling by using resist simulation and pattern matching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 309-318

  Cheng, Mosong ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

ArF; Chemically amplified resist; Image mismatching factor; Line end shortening; Optimization; Simulation

Indexed keywords

ABERRATIONS; ALGORITHMS; COMPUTER SIMULATION; IMAGING TECHNIQUES; LENSES; OPTIMIZATION; PATTERN MATCHING; SCANNING ELECTRON MICROSCOPY;

RESIST SIMULATION;

PHOTORESISTS;

EID: 0035758722     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435731     Document Type: Conference Paper

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