|
|
|
Volumn 9, Issue 2, 2000, Pages 25-26
|
|
Line end shortening
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
COMPUTER SIMULATION;
MASKS;
PHOTORESISTS;
THREE DIMENSIONAL;
CRITICAL DIMENSIONED;
GAP WIDTH;
LINE END SHORTENING;
PHOTORESIST PATTERN;
PHOTOLITHOGRAPHY;
|
|
EID: 0034156653
PISSN: 1074407X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
|
Times cited : (4)
|
|
References (1)
|
