Fast imaging algorithm for simulating pattern transfer in deep-UV resist and extracting post exposure bake parameters

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 854-864

  Cheng, Mosong ^a   Croffie, Ebo ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; COMPUTER SIMULATION; IMAGE ANALYSIS; ITERATIVE METHODS; MATHEMATICAL TRANSFORMATIONS; PARTIAL DIFFERENTIAL EQUATIONS; POLYNOMIALS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESIST; RAPID IMAGING ANALYSIS FOR RESISTS (RIAR);

PHOTORESISTS;

EID: 0033692161     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388372     Document Type: Conference Paper

References (8)