Adhesion and cohesion analysis of ArF/SOR resist patterns with microtip of atomic force microscope(AFM)

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 507-512

  Kawai, Akira ^a   Moriike, Norio ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; Atomic force microscope; Peeling; Young's modulus

Indexed keywords

POLYMER;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; GEOMETRY; MICROSCOPY; SCANNING ELECTRON MICROSCOPY; YOUNG MODULUS;

EID: 0035746895     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.507     Document Type: Article

References (15)