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Volumn 17, Issue 3, 1999, Pages 1090-1093

Collapse behavior of microresist pattern analyzed by the tip indentation method with an atomic force microscope

Author keywords

[No Author keywords available]

Indexed keywords


EID: 22644451254     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590700     Document Type: Article
Times cited : (14)

References (12)
  • 1
    • 60849129828 scopus 로고    scopus 로고
    • Advances in Resist Technology and Processing XV, Santa Clara, CA
    • SPIE, Bellingham, WA
    • J. Y. Yu, G. M. Jeong, S. P. Kim, J. K. Jeong, and H. S. Kim, Advances in Resist Technology and Processing XV, Santa Clara, CA, Proc. SPIE, Microlithography (SPIE, Bellingham, WA, 1998), Vol. 3333, p. 880.
    • (1998) Proc. SPIE, Microlithography , vol.3333 , pp. 880
    • Yu, J.Y.1    Jeong, G.M.2    Kim, S.P.3    Jeong, J.K.4    Kim, H.S.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.