Analysis of resist pattern collapse by direct peeling method with atomic force microscope tip

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 3 A, 2000, Pages 1426-1429

  Kawai, Akira ^a   Kaneko, Yoshihisa ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; Atomic force microscopy; Collapse; Finite element method; Internal stress; Residue; Resist

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; FINITE ELEMENT METHOD; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; STRESS ANALYSIS; STRESS CONCENTRATION;

DIRECT PEELING METHOD; RESIST PATTERN COLLAPSE;

PHOTORESISTS;

EID: 0033732947     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1426     Document Type: Article

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