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Volumn 675, Issue , 2001, Pages
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Comparison of CPM, PDS and optical transmittance of amorphous carbon nitride films made by a nitrogen radical sputter method
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ELECTRONIC DENSITY OF STATES;
ENERGY GAP;
LIGHT TRANSMISSION;
NITROGEN;
PHOTOCONDUCTIVITY;
PHOTOCURRENTS;
PHOTONS;
PHOTOSENSITIVITY;
SPECTROSCOPY;
SPUTTER DEPOSITION;
AMORPHOUS CARBON NITRIDE FILMS;
CONSTANT PHOTOCURRENT METHOD;
DARK ELECTRICAL CONDUCTIVITY;
NITROGEN RADICAL SPUTTER METHOD;
OPTICAL ENERGY BAND GAL;
OPTICAL TRANSMITTANCE SPECTRA;
PHOTOTHERMAL DEFLECTION SPECTROSCOPY;
CARBON NITRIDE;
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EID: 0035743542
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (11)
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