SCOPUS 정보 검색 플랫폼

Surface Review and Letters

Volumn 8, Issue 5, 2001, Pages 527-532

Study of Cu diffusion in Cu/Tan/SiO2/Si multilayer structures

(9) Zhang, D H a Loh, S W a Li, C Y b Foo, P D b Xie, Joseph b Liu, R c Wee, A T S c Zhang, L d Lee, Y K d

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b INSTITUTE OF MICROELECTRONICS (Singapore)

c NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

d NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER DERIVATIVE; SILICON; SILICON DIOXIDE; TANTALUM;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CRYSTALLOGRAPHY; DIFFUSION; MOLECULAR INTERACTION; STRUCTURE ANALYSIS; TEMPERATURE SENSITIVITY; THERMAL ANALYSIS; VAPOR; X RAY DIFFRACTION;

EID: 0035741284 PISSN: 0218625X EISSN: None Source Type: Journal
DOI: 10.1016/S0218-625X(01)00127-0 Document Type: Article

Times cited : (5)

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