Models of void electromigration

European Journal of Applied Mathematics

Volumn 12, Issue 2, 2001, Pages 97-134

  Cummings, L J ^a,c   Richardson, G ^a,c   Ben Amar, M ^b  

^a LABORATOIRE DE PHYSIQUE STATISTIQUE   (France)

^b Massachusetts Institute of Technology Cambridge   (United States)

^c UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035631133     PISSN: 09567925     EISSN: None     Source Type: Journal    
DOI: 10.1017/S0956792501004326     Document Type: Article

References (32)

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