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Diamond and Related Materials

Volumn 10, Issue 12, 2001, Pages 2167-2173

Growth of cubic boron nitride films by ibad and triode sputtering: Development of intrinsic stress

(5) Djouadi, M A a,b Mortet, V a Khandozhko, S a Ilias, S c Stambouli, V d

a ENSAM (France)

b EPFL (Switzerland)

c UNIVERSITÉ DE MONTRÉAL (Canada)

d CNRS (France)

Author keywords

Cubic boron nitride; Dynamic stress profile; In depth stress profile; Ion assisted deposition

Indexed keywords

DENSIFICATION; FILM GROWTH; INFRARED SPECTROSCOPY; ION BEAMS; NUCLEATION; REACTIVE ION ETCHING; SPUTTERING; STRESS ANALYSIS; SUBSTRATES;

ION BEAM ASSITED EVAPORATION;

CUBIC BORON NITRIDE;

BORON NITRIDE; COATING; FILM; SPUTTERING; STRESS;

EID: 0035577884 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(01)00498-8 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.