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Surface Science

Volumn 494, Issue 3, 2001, Pages 251-264

Photoemission studies of the surface reactivity of thiophene on Si(100)-(2×1), Si(111)-(7×7) and Ge(100)-(2×1)

(3) Rousseau, Gilles B D a Dhanak, Vin b Kadodwala, Malcolm a

a UNIVERSITY OF GLASGOW (United Kingdom)

b DARESBURY LABORATORY (United Kingdom)

Author keywords

Germanium; Photoelectron spectroscopy; Silicon

Indexed keywords

ADSORPTION; AROMATIC COMPOUNDS; BAND STRUCTURE; DIMERS; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; REACTION KINETICS; SEMICONDUCTING SILICON;

THIOPHENES;

SURFACE REACTIONS;

EID: 0035575732 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01480-7 Document Type: Article

Times cited : (15)

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