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Journal of Non-Crystalline Solids

Volumn 296, Issue 1-2, 2001, Pages 27-38

Instability evolution within a-SiNx film assessed through MIS structure under bias and temperature stresses

(3) Özdemir, Orhan a Atilgan, Ismail a Katircioǧlu, Bayram a

a MIDDLE EAST TECHNICAL UNIVERSITY (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CAPACITANCE; ELECTRIC POTENTIAL; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL STRESS;

METAL INSULATOR SEMICONDUCTOR STRUCTURES (MIS)_;

AMORPHOUS FILMS;

EID: 0035575695 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)00892-4 Document Type: Article

Times cited : (7)

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