Thermodynamic calculations offer insight in the stability of materials: The annealing behavior of amorphous Ru-Si-O and Ir-Si-O thin films

Calphad: Computer Coupling of Phase Diagrams and Thermochemistry

Volumn 25, Issue 4, 2001, Pages 639-644

  Pisch, Alexander ^a   Bernard, Claude ^a  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GIBBS FREE ENERGY; IRIDIUM ALLOYS; MICROELECTRONICS; OXIDATION; PHASE DIAGRAMS; RUTHENIUM ALLOYS; TERNARY SYSTEMS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS THIN FILMS;

AMORPHOUS FILMS;

EID: 0035572835     PISSN: 03645916     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0364-5916(02)00013-5     Document Type: Conference Paper

References (11)