Dislocation nucleation and propagation during deposition of cubic metal thin films

Materials Research Society Symposium - Proceedings

Volumn 677, Issue , 2001, Pages

  Liu, W C ^a   Wang, Y X ^a   Woo, C H ^a   Huang, Hanchen ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL STRUCTURE; DEPOSITION; DISLOCATIONS (CRYSTALS); MOLECULAR DYNAMICS; NUCLEATION;

ATOMISTIC SIMULATOR; BODY CENTERED CUBIC; CUBIC METAL THIN FILMS; FACE CENTERED CUBIC; POLYCRYSTALLINE THIN FILMS;

POLYCRYSTALLINE MATERIALS;

EID: 0035558831     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-677-aa7.32     Document Type: Conference Paper

References (17)

1. Formulation of atomic level stress tensor in silicon