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Materials Research Society Symposium - Proceedings

Volumn 670, Issue , 2001, Pages

A comparative study of nickel silicide formation using a titanium cap layer and a titanium interlayer

(4) Tan, W L a Pey, K L a Chooi, Simon Y M a Ye, J H a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; RAPID THERMAL ANNEALING; SUBSTRATES; TITANIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACIAL NATIVE OXIDES;

NICKEL COMPOUNDS;

EID: 0035557035 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-670-k6.6 Document Type: Conference Paper

Times cited : (8)

References (13)

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