Shallow junctions for sub-100 nm CMOS technology

Materials Research Society Symposium - Proceedings

Volumn 669, Issue , 2001, Pages J351-J356

  Meyssen, Veerle ^a   Stolk, Peter ^a   Van Zijl, Jeroen ^a   Van Berkum, Jurgen ^a   Van de Wijgert, Willem ^a   Lindsay, Richard ^a   Dachs, Charles ^a   Mannino, Giovanni ^a   Cowern, Nick ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIFFUSION; ELECTRIC RESISTANCE; ION IMPLANTATION; RAPID THERMAL ANNEALING; SEMICONDUCTOR DOPING;

SHALLOW JUNCTIONS;

SEMICONDUCTOR JUNCTIONS;

EID: 0035556892     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-669-j3.5     Document Type: Article

References (13)